UV Exposure Systems

UV spot curing system ：HYPERCURE-200

HC-200 is an ideal UV spot curing system to cure UV Curing adhesive or UV curing ink.
The lamp HC-200 uses is a high power Mercury-Xenon Lamp, and we cut Infrared wavelength to avoid building up heat of target under curing. 

Mask Aligner UV Exposure system  ：UFM-50110R

UFM-50110R deep UV Exposure system uses 250nm with a effective exposure area of 110mm diameter with excellent uniformity.  Optics is integrated with UV Dichroic mirror to cut IR radiation. 

UV Exposure Light sources ：UFM series

UFM series offers  a customer to chose a main UV wavelength by picking up a desired mirror and also user can change the mirror to pick up a different wavelength. Exposure area of UFM series has  excellent uniformity.

UV Exposure system”Uniform UV Light”：UFM-200

It contains 200W Mercury-Xenon Lamp and provides 50mmx50mm exposure area with excellent uniformity. Non-uniformity at the exposure plane is better than +/-5% and parallelism is smaller than +/- 3 deg.

Polarized UV beam exposure system ：HC-1001PUFM

Polarized UV exposure system uses Mercury Xenon lamp and a combination of UV dichroic mirror(cold mirror) and an optical integrator realizes a UV exposure with a polarized beam.
 Extinction ratio of 50 to 1 or better can be achieved.
 Also with a combination of high transmission interference filter, system can expose a selected UV wavelength.